KETAB DOWNLOAD

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

15.00$
Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications
KETAB DOWNLOAD

Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications

15.00$

2nd Edition 

by Tommi Kääriäinen (Author), David Cameron (Author), Marja-Leena Kääriäinen (Author), Arthur Sherman (Author) 

Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

Year:
2013
Pages:
264
Language:
English
Format:
PDF
Size:
4 MB
Publisher:
Wiley-Scrivener
ISBN-10:
1118062779
ISBN-13:
978-1118062777
ASIN:
B00CWZJDBS